Microstructure and Electric Transport Characteristic of Microcrystalline Silicon Films Fabricated by Very High Frequency Plasma Enhanced Chemical Vapor Deposition

Wang, X. / Huang, R. / Song, J. et al. | British Library Online Contents | 2011

Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System

Guo, Y.Q. / Huang, R. / Song, J. et al. | British Library Online Contents | 2011

Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Qi, L. / Hu, Z. / Li, W. et al. | British Library Online Contents | 2012

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Hamidinezhad, H. / Wahab, Y. / Othaman, Z. et al. | British Library Online Contents | 2011

High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma

Liao, F. / Park, S. / Larson, J. M. et al. | British Library Online Contents | 2003