Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    A Study on Surface Roughness of Curved Silicon Crystal Spectrometer Fabricated by Plasma Chemical Vaporization Machining

    New search for: Yamamoto, Y.
    New search for: Hosoda, M.
    New search for: Nagano, M.
    New search for: Yamamura, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    A Study on Surface Roughness of Curved Silicon Crystal Spectrometer Fabricated by Plasma Chemical Vaporization Machining

    New search for: Yamamoto, Y.
    New search for: Hosoda, M.
    New search for: Nagano, M.
    New search for: Yamamura, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A Study on Surface Roughness of Curved Silicon Crystal Spectrometer Fabricated by Plasma Chemical Vaporization Machining

    New search for: Yamamoto, Y.
    New search for: Hosoda, M.
    New search for: Nagano, M.
    New search for: Yamamura, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    A Study on Surface Roughness of Curved Silicon Crystal Spectrometer Fabricated by Plasma Chemical Vaporization Machining

    Contributors:

    Yamamoto, Y. (author) / Hosoda, M. (author) / Nagano, M. (author) / Yamamura, K. (author)

    Published in:

    KEY ENGINEERING MATERIALS ; 516 ; 522-526

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Fabrication of Damage-Free Curved Silicon Crystal Substrate for a Focusing X-Ray Spectrometer by Plasma Chemical Vaporization Machining

    Hosoda, M. / Ueda, K. / Nagano, M. et al. | British Library Online Contents | 2010

    Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

    Kato, T. / Sano, Y. / Hara, H. et al. | British Library Online Contents | 2009

    Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

    Kato, T. / Sano, Y. / Hara, H. et al. | British Library Online Contents | 2009

    Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide

    Sano, Y. / Watanabe, M. / Kato, T. et al. | British Library Online Contents | 2009

    Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide

    Sano, Y. / Watanabe, M. / Kato, T. et al. | British Library Online Contents | 2009

    Back to top