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Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

Kato, T. / Sano, Y. / Hara, H. / Mimura, H. / Yamamura, K. / Yamauchi, K.

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Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

Kato, T. / Sano, Y. / Hara, H. / Mimura, H. / Yamamura, K. / Yamauchi, K.

Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

Kato, T. / Sano, Y. / Hara, H. / Mimura, H. / Yamamura, K. / Yamauchi, K.

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Check availability in my library

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Document information

Title:

Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

Contributors:

Kato, T. (author) / Sano, Y. (author) / Hara, H. (author) / Mimura, H. (author) / Yamamura, K. (author) / Yamauchi, K. (author)

Published in:

MATERIALS SCIENCE FORUM ; 600/603 ; 843-846

Publication date:

2009-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Kato, T. / Sano, Y. / Hara, H. et al. | British Library Online Contents | 2009

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