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Study on nanocomposite Ti-Al-Si-Cu-N films with various Si contents deposited by cathodic vacuum arc ion plating
Study on nanocomposite Ti-Al-Si-Cu-N films with various Si contents deposited by cathodic vacuum arc ion plating
Study on nanocomposite Ti-Al-Si-Cu-N films with various Si contents deposited by cathodic vacuum arc ion plating
Shi, J. (author) / Muders, C. M. (author) / Kumar, A. (author) / Jiang, X. (author) / Pei, Z. L. (author) / Gong, J. (author) / Sun, C. (author)
APPLIED SURFACE SCIENCE ; 258 ; 9642-9649
2012-01-01
8 pages
Article (Journal)
English
DDC:
621.35
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