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Activation of ion-implanted polycrystalline silicon thin films prepared on glass substrates

So, B.-S. / Bae, S.-M. / You, Y.-H. / Kim, Y.-H. / Hwang, J.-H.

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Activation of ion-implanted polycrystalline silicon thin films prepared on glass substrates

So, B.-S. / Bae, S.-M. / You, Y.-H. / Kim, Y.-H. / Hwang, J.-H.

Activation of ion-implanted polycrystalline silicon thin films prepared on glass substrates

So, B.-S. / Bae, S.-M. / You, Y.-H. / Kim, Y.-H. / Hwang, J.-H.

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Document information

Title:

Activation of ion-implanted polycrystalline silicon thin films prepared on glass substrates

Contributors:

So, B.-S. (author) / Bae, S.-M. (author) / You, Y.-H. (author) / Kim, Y.-H. (author) / Hwang, J.-H. (author) / Boo, J.-H. / Ahn, H.

Published in:

Proceedings of the IFFM2011 (2011 International Forum on Functional Materials) and AFM-2 (2nd Special Symposium on Advances in Functional Materials) Jeju island, Korea 28-31 July 2011 ; 3048-3051

MATERIALS RESEARCH BULLETIN ; 47

Publication date:

2012-01-01

Size:

4 pages

ISSN:

0025-5408

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11 / 620

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