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Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching
Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching
Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching
Cheng, S. L. (author) / Lin, Y. H. (author) / Lee, S. W. (author) / Lee, T. (author) / Chen, H. (author) / Hu, J. C. (author) / Chen, L. T. (author)
APPLIED SURFACE SCIENCE ; 263 ; 430-435
2012-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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