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    Lithography: Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch (Adv. Mater. 44/2012)

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    New search for: Hahn, J. W.

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    Lithography: Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch (Adv. Mater. 44/2012)

    New search for: Kim, S.
    New search for: Jung, H.
    New search for: Kim, Y.
    New search for: Jang, J.
    New search for: Hahn, J. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Lithography: Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch (Adv. Mater. 44/2012)

    New search for: Kim, S.
    New search for: Jung, H.
    New search for: Kim, Y.
    New search for: Jang, J.
    New search for: Hahn, J. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Lithography: Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch (Adv. Mater. 44/2012)

    Contributors:

    Kim, S. (author) / Jung, H. (author) / Kim, Y. (author) / Jang, J. (author) / Hahn, J. W. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; OP273-OP273

    Publication date:

    2012-01-01

    Size:

    OP273-OP273

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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