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Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch

Kim, S. / Jung, H. / Kim, Y. / Jang, J. / Hahn, J. W.

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Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch

Kim, S. / Jung, H. / Kim, Y. / Jang, J. / Hahn, J. W.

Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch

Kim, S. / Jung, H. / Kim, Y. / Jang, J. / Hahn, J. W.

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Check availability in my library

Order at Subito €

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Document information

Title:

Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch

Contributors:

Kim, S. (author) / Jung, H. (author) / Kim, Y. (author) / Jang, J. (author) / Hahn, J. W. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; OP337-OP344

Publication date:

2012-01-01

Size:

OP337-OP344

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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