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Thermal processing of strained silicon-on-insulator for atomically precise silicon device fabrication
Thermal processing of strained silicon-on-insulator for atomically precise silicon device fabrication
Thermal processing of strained silicon-on-insulator for atomically precise silicon device fabrication
Lee, W. C. (author) / Bishop, N. (author) / Thompson, D. L. (author) / Xue, K. (author) / Scappucci, G. (author) / Cederberg, J. G. (author) / Gray, J. K. (author) / Han, S. M. (author) / Celler, G. K. (author) / Carroll, M. S. (author)
APPLIED SURFACE SCIENCE ; 265 ; 833-838
2013-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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