Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Crystallographic study on self-annealing of electroplated copper at room temperature

    New search for: Shinada, E.
    New search for: Nagoshi, T.
    New search for: Chang, T. F. M.
    New search for: Sone, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Crystallographic study on self-annealing of electroplated copper at room temperature

    New search for: Shinada, E.
    New search for: Nagoshi, T.
    New search for: Chang, T. F. M.
    New search for: Sone, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Crystallographic study on self-annealing of electroplated copper at room temperature

    New search for: Shinada, E.
    New search for: Nagoshi, T.
    New search for: Chang, T. F. M.
    New search for: Sone, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Crystallographic study on self-annealing of electroplated copper at room temperature

    Contributors:

    Shinada, E. (author) / Nagoshi, T. (author) / Chang, T. F. M. (author) / Sone, M. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 16 ; 633-639

    Publication date:

    2013-01-01

    Size:

    7 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Self-annealing of electrodeposited copper thin film during room temperature storage

    Dong, W. / Zhang, J. / Zheng, J. et al. | British Library Online Contents | 2008

    On the room-temperature annealing of cryogenically rolled copper

    Konkova, T. / Mironov, S. / Korznikov, A. et al. | British Library Online Contents | 2011

    The annealing behavior of copper deposit electroplated in sulfuric acid bath with various concentrations of thiourea

    Kao, Y. L. / Tu, G. C. / Huang, C. A. et al. | British Library Online Contents | 2004

    The significance of self-annealing at room temperature in high purity copper processed by high-pressure torsion

    Huang, Yi / Sabbaghianrad, Shima / Almazrouee, Abdulla I. et al. | British Library Online Contents | 2016

    Texture of Electroplated Copper Film under Biaxial Stress

    Hong, B. / Jiang, C.-h. / Wang, X.-j. | British Library Online Contents | 2006

    Back to top