Characterization of Rutile N-Doped TiO~2 Films Prepared by RF Magnetron Sputtering: Fid-Bau Portal

Characterization of Rutile N-Doped TiO~2 Films Prepared by RF Magnetron Sputtering

Dobromir, M. / Manole, A.V. / Rebegea, S. / Apetrei, R. / Neagu, M. / Luca, D.

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Characterization of Rutile N-Doped TiO~2 Films Prepared by RF Magnetron Sputtering

Dobromir, M. / Manole, A.V. / Rebegea, S. / Apetrei, R. / Neagu, M. / Luca, D.

Characterization of Rutile N-Doped TiO~2 Films Prepared by RF Magnetron Sputtering

Dobromir, M. / Manole, A.V. / Rebegea, S. / Apetrei, R. / Neagu, M. / Luca, D.

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Title:

Characterization of Rutile N-Doped TiO~2 Films Prepared by RF Magnetron Sputtering

Contributors:

Dobromir, M. (author) / Manole, A.V. (author) / Rebegea, S. (author) / Apetrei, R. (author) / Neagu, M. (author) / Luca, D. (author) / Hristoforou, E. / Vlachos, D.S.

Published in:

Materials and Applications for Sensors and Transducers II ; 277-280

KEY ENGINEERING MATERIALS ; 543

Publication date:

2013-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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