The use of potassium peroxidisulphate and OxoneÂ® as oxidizers for the chemical mechanical polishing of silicon wafers: Fid-Bau Portal

The use of potassium peroxidisulphate and OxoneÂ® as oxidizers for the chemical mechanical polishing of silicon wafers

PiÃ±eiro, A. / Black, A. / Medina, J. / Dieguez, E. / Parra, V.

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The use of potassium peroxidisulphate and OxoneÂ® as oxidizers for the chemical mechanical polishing of silicon wafers

PiÃ±eiro, A. / Black, A. / Medina, J. / Dieguez, E. / Parra, V.

The use of potassium peroxidisulphate and OxoneÂ® as oxidizers for the chemical mechanical polishing of silicon wafers

PiÃ±eiro, A. / Black, A. / Medina, J. / Dieguez, E. / Parra, V.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The use of potassium peroxidisulphate and OxoneÂ® as oxidizers for the chemical mechanical polishing of silicon wafers

Contributors:

PiÃ±eiro, A. (author) / Black, A. (author) / Medina, J. (author) / Dieguez, E. (author) / Parra, V. (author)

Published in:

WEAR -LAUSANNE- ; 303 ; 446-450

Publication date:

2013-01-01

Size:

5 pages

ISSN:

0043-1648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11292

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