Wear phenomena in chemical mechanical polishing

Liang, H. / Kaufman, F. / Sevilla, R. et al. | British Library Online Contents | 1997

Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. et al. | British Library Online Contents | 2010

Chemical-Mechanical Polishing of Wafers with Copper Film by Nano-Scale Abrasives

Tsai, J.C. / Kao, J.F. | British Library Online Contents | 2008

Applications of Polishing Technology Using Polymer Particles to Silicon Wafers and Quartz Crystal Wafers

Lu, Y. S. / Tani, Y. / Soutome, K. et al. | British Library Online Contents | 2007

The use of potassium peroxidisulphate and Oxone® as oxidizers for the chemical mechanical polishing of silicon wafers

Piñeiro, A. / Black, A. / Medina, J. et al. | British Library Online Contents | 2013