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Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition
Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition
Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition
Escobar-Alarcon, L. (author) / Solis-Casados, D. A. (author) / Romero, S. (author) / Fernandez, M. (author) / Perez-Alvarez, J. (author) / Haro-Poniatowski, E. (author)
APPLIED SURFACE SCIENCE ; 283 ; 808-812
2013-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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