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    Electroless chemical etching of silicon in aqueous NH"4F/AgNO"3/HNO"3 solution

    New search for: Megouda, N.
    New search for: Hadjersi, T.
    New search for: Szunerits, S.
    New search for: Boukherroub, R.

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    Electroless chemical etching of silicon in aqueous NH"4F/AgNO"3/HNO"3 solution

    New search for: Megouda, N.
    New search for: Hadjersi, T.
    New search for: Szunerits, S.
    New search for: Boukherroub, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electroless chemical etching of silicon in aqueous NH"4F/AgNO"3/HNO"3 solution

    New search for: Megouda, N.
    New search for: Hadjersi, T.
    New search for: Szunerits, S.
    New search for: Boukherroub, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Electroless chemical etching of silicon in aqueous NH"4F/AgNO"3/HNO"3 solution

    Contributors:

    Megouda, N. (author) / Hadjersi, T. (author) / Szunerits, S. (author) / Boukherroub, R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 284 ; 894-899

    Publication date:

    2013-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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