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Fabrication of Low Stress PECVD-SiNx Film in High Frequency Mode

Shang, Z.G. / Li, D.L. / Wen, Z.Y.

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Fabrication of Low Stress PECVD-SiNx Film in High Frequency Mode

Shang, Z.G. / Li, D.L. / Wen, Z.Y.

Fabrication of Low Stress PECVD-SiNx Film in High Frequency Mode

Shang, Z.G. / Li, D.L. / Wen, Z.Y.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Fabrication of Low Stress PECVD-SiNx Film in High Frequency Mode

Contributors:

Shang, Z.G. (author) / Li, D.L. (author) / Wen, Z.Y. (author) / Tang, F.

Published in:

Micro-Nano Technology XIV ; 22-27

KEY ENGINEERING MATERIALS ; 562/565

Publication date:

2013-01-01

Size:

6 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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