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Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions
Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions
Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions
Bauhuber, M. (author) / Mikrievskij, A. (author) / Lechner, A. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 16 ; 1428-1433
2013-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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