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    Dependence of annealing on stability of transparent amorphous InGaZnO thin film transistor

    New search for: Li, X.
    New search for: Xin, E.
    New search for: Chen, L.
    New search for: Shi, J.
    New search for: Li, C.
    New search for: Zhang, J.
    New search for: Cheong, K. Y.
    New search for: Paskaleva, A.

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    Dependence of annealing on stability of transparent amorphous InGaZnO thin film transistor

    New search for: Li, X.
    New search for: Xin, E.
    New search for: Chen, L.
    New search for: Shi, J.
    New search for: Li, C.
    New search for: Zhang, J.
    New search for: Cheong, K. Y.
    New search for: Paskaleva, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Dependence of annealing on stability of transparent amorphous InGaZnO thin film transistor

    New search for: Li, X.
    New search for: Xin, E.
    New search for: Chen, L.
    New search for: Shi, J.
    New search for: Li, C.
    New search for: Zhang, J.
    New search for: Cheong, K. Y.
    New search for: Paskaleva, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Dependence of annealing on stability of transparent amorphous InGaZnO thin film transistor

    Contributors:

    Li, X. (author) / Xin, E. (author) / Chen, L. (author) / Shi, J. (author) / Li, C. (author) / Zhang, J. (author) / Cheong, K. Y. / Paskaleva, A.

    Published in:

    Advanced Oxides for Electronics ; 1292-1296

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 16

    Publication date:

    2013-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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