Indium Tin Oxide Films with Low Resistivity at Room Temperature Using DC Magnetron Sputtering with Grid Electrode: Fid-Bau Portal

Indium Tin Oxide Films with Low Resistivity at Room Temperature Using DC Magnetron Sputtering with Grid Electrode

Lee, H.-N. / Hur, J.-Y. / Kim, H.J. / Lee, M.H. / Lee, H.K.

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Indium Tin Oxide Films with Low Resistivity at Room Temperature Using DC Magnetron Sputtering with Grid Electrode

Lee, H.-N. / Hur, J.-Y. / Kim, H.J. / Lee, M.H. / Lee, H.K.

Indium Tin Oxide Films with Low Resistivity at Room Temperature Using DC Magnetron Sputtering with Grid Electrode

Lee, H.-N. / Hur, J.-Y. / Kim, H.J. / Lee, M.H. / Lee, H.K.

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Check availability in my library

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Document information

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Document information

Title:

Indium Tin Oxide Films with Low Resistivity at Room Temperature Using DC Magnetron Sputtering with Grid Electrode

Contributors:

Lee, H.-N. (author) / Hur, J.-Y. (author) / Kim, H.J. (author) / Lee, M.H. (author) / Lee, H.K. (author)

Published in:

MATERIALS TRANSACTIONS ; 55 ; 605-609

Publication date:

2014-01-01

Size:

5 pages

ISSN:

1345-9678

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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