AFM and Ellipsometry Studies of Ultra Thin Ti Film Deposited on a Silicon Wafer: Fid-Bau Portal

AFM and Ellipsometry Studies of Ultra Thin Ti Film Deposited on a Silicon Wafer

Lin, B.J. / Zhu, H.T. / Tieu, A.K. / Triani, G.

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AFM and Ellipsometry Studies of Ultra Thin Ti Film Deposited on a Silicon Wafer

Lin, B.J. / Zhu, H.T. / Tieu, A.K. / Triani, G.

AFM and Ellipsometry Studies of Ultra Thin Ti Film Deposited on a Silicon Wafer

Lin, B.J. / Zhu, H.T. / Tieu, A.K. / Triani, G.

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Document information

Title:

AFM and Ellipsometry Studies of Ultra Thin Ti Film Deposited on a Silicon Wafer

Contributors:

Lin, B.J. (author) / Zhu, H.T. (author) / Tieu, A.K. (author) / Triani, G. (author) / Tieu, A.K. / Zhu, H. / Zhu, Q.

Published in:

Advances in Materials and Processing Technologies XV Selected peer reviewed papers from the 15^t^h International Conference on Advances in Materials and Processing Technologies (AMPT 2012), September 23-26, 2012, Wollongong, Australia ; 616-625

MATERIALS SCIENCE FORUM ; 773/774

Publication date:

2014-01-01

Size:

10 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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