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Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Fu, W. E. / Chang, C. W. / Chang, Y. Q. / Yao, C. K. / Liao, J. D.

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Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Fu, W. E. / Chang, C. W. / Chang, Y. Q. / Yao, C. K. / Liao, J. D.

Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Fu, W. E. / Chang, C. W. / Chang, Y. Q. / Yao, C. K. / Liao, J. D.

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Check availability in my library

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Document information

Title:

Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Contributors:

Fu, W. E. (author) / Chang, C. W. (author) / Chang, Y. Q. (author) / Yao, C. K. (author) / Liao, J. D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 8974-8979

Publication date:

2012-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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