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FT IR spectroscopy of silicon oxide and HfSiOx layer formation

Kopani, M. / Mikula, M. / Pincik, E. / Kobayashi, H. / Takahashi, M.

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FT IR spectroscopy of silicon oxide and HfSiOx layer formation

Kopani, M. / Mikula, M. / Pincik, E. / Kobayashi, H. / Takahashi, M.

FT IR spectroscopy of silicon oxide and HfSiOx layer formation

Kopani, M. / Mikula, M. / Pincik, E. / Kobayashi, H. / Takahashi, M.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

FT IR spectroscopy of silicon oxide and HfSiOx layer formation

Contributors:

Kopani, M. (author) / Mikula, M. (author) / Pincik, E. (author) / Kobayashi, H. (author) / Takahashi, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 312 ; 117-119

Publication date:

2014-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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