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    FT IR spectroscopy of silicon oxide and HfSiO"x layer formation

    New search for: Kopani, M.
    New search for: Mikula, M.
    New search for: Pincik, E.
    New search for: Kobayashi, H.
    New search for: Takahashi, M.

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    FT IR spectroscopy of silicon oxide and HfSiO"x layer formation

    New search for: Kopani, M.
    New search for: Mikula, M.
    New search for: Pincik, E.
    New search for: Kobayashi, H.
    New search for: Takahashi, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    FT IR spectroscopy of silicon oxide and HfSiO"x layer formation

    New search for: Kopani, M.
    New search for: Mikula, M.
    New search for: Pincik, E.
    New search for: Kobayashi, H.
    New search for: Takahashi, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    FT IR spectroscopy of silicon oxide and HfSiO"x layer formation

    Contributors:

    Kopani, M. (author) / Mikula, M. (author) / Pincik, E. (author) / Kobayashi, H. (author) / Takahashi, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 313 ; 117-119

    Publication date:

    2014-01-01

    Size:

    3 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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