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FT IR spectroscopy of silicon oxide and HfSiOx layer formation
FT IR spectroscopy of silicon oxide and HfSiOx layer formation
FT IR spectroscopy of silicon oxide and HfSiOx layer formation
Kopani, M. (Autor:in) / Mikula, M. (Autor:in) / Pincik, E. (Autor:in) / Kobayashi, H. (Autor:in) / Takahashi, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 312 ; 117-119
01.01.2014
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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