Structure and Epitaxial Behavior of Rutile TiO~2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing: Fid-Bau Portal

Structure and Epitaxial Behavior of Rutile TiO~2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Roch, T. / Durina, P. / Truchly, M. / Plecenik, T. / Grancic, B. / Mikula, M. / Haidry, A.A. / Gregor, M. / Satrapinskyy, L. / Kus, P.

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Structure and Epitaxial Behavior of Rutile TiO~2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Roch, T. / Durina, P. / Truchly, M. / Plecenik, T. / Grancic, B. / Mikula, M. / Haidry, A.A. / Gregor, M. / Satrapinskyy, L. / Kus, P.

Structure and Epitaxial Behavior of Rutile TiO~2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Roch, T. / Durina, P. / Truchly, M. / Plecenik, T. / Grancic, B. / Mikula, M. / Haidry, A.A. / Gregor, M. / Satrapinskyy, L. / Kus, P.

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Title:

Structure and Epitaxial Behavior of Rutile TiO~2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Contributors:

Roch, T. (author) / Durina, P. (author) / Truchly, M. (author) / Plecenik, T. (author) / Grancic, B. (author) / Mikula, M. (author) / Haidry, A.A. (author) / Gregor, M. (author) / Satrapinskyy, L. (author) / Kus, P. (author)

Published in:

KEY ENGINEERING MATERIALS ; 605 ; 487-490

Publication date:

2014-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Tanemura, S. / Miao, L. / Jin, P. et al. | British Library Online Contents | 2003

Characterization of Rutile N-Doped TiO~2 Films Prepared by RF Magnetron Sputtering

Dobromir, M. / Manole, A.V. / Rebegea, S. et al. | British Library Online Contents | 2013

LaB~x thin films prepared by magnetron sputtering

Kinbara, A. / Nakano, T. / Kobayashi, A. et al. | British Library Online Contents | 1993

LaB~x thin films prepared by magnetron sputtering

Kinbara, A. / Nakano, T. / Kobayashi, A. et al. | British Library Online Contents | 1993