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Interface sulfur passivation using H"2S annealing for atomic-layer-deposited Al"2O"3 films on an ultrathin-body In"0"."5"3Ga"0"."4"7As-on-insulator
Interface sulfur passivation using H"2S annealing for atomic-layer-deposited Al"2O"3 films on an ultrathin-body In"0"."5"3Ga"0"."4"7As-on-insulator
Interface sulfur passivation using H"2S annealing for atomic-layer-deposited Al"2O"3 films on an ultrathin-body In"0"."5"3Ga"0"."4"7As-on-insulator
Jin, H. S. (author) / Cho, Y. J. (author) / Lee, S. M. (author) / Kim, D. H. (author) / Kim, D. W. (author) / Lee, D. (author) / Park, J. B. (author) / Won, J. Y. (author) / Lee, M. J. (author) / Cho, S. H. (author)
APPLIED SURFACE SCIENCE ; 315 ; 178-183
2014-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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