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Fabrication of silicon wafer with ultra low reflectance by chemical etching method

Cao, Y. / Liu, A. / Li, H. / Liu, Y. / Qiao, F. / Hu, Z. / Sang, Y.

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Fabrication of silicon wafer with ultra low reflectance by chemical etching method

Cao, Y. / Liu, A. / Li, H. / Liu, Y. / Qiao, F. / Hu, Z. / Sang, Y.

Fabrication of silicon wafer with ultra low reflectance by chemical etching method

Cao, Y. / Liu, A. / Li, H. / Liu, Y. / Qiao, F. / Hu, Z. / Sang, Y.

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Title:

Fabrication of silicon wafer with ultra low reflectance by chemical etching method

Contributors:

Cao, Y. (author) / Liu, A. (author) / Li, H. (author) / Liu, Y. (author) / Qiao, F. (author) / Hu, Z. (author) / Sang, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 7411-7414

Publication date:

2011-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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