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    Research on HfSiN Diffusion Barrier Thin Film for Micro-Nanoscale ULSI-Cu Metallization

    New search for: Liu, X.M.
    New search for: Chen, X.H.
    New search for: Han, Y.Q.
    New search for: Ma, W.H.
    New search for: He, J.L.
    New search for: Xiao, Y.Y.
    New search for: Li, J.

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    Research on HfSiN Diffusion Barrier Thin Film for Micro-Nanoscale ULSI-Cu Metallization

    New search for: Liu, X.M.
    New search for: Chen, X.H.
    New search for: Han, Y.Q.
    New search for: Ma, W.H.
    New search for: He, J.L.
    New search for: Xiao, Y.Y.
    New search for: Li, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Research on HfSiN Diffusion Barrier Thin Film for Micro-Nanoscale ULSI-Cu Metallization

    New search for: Liu, X.M.
    New search for: Chen, X.H.
    New search for: Han, Y.Q.
    New search for: Ma, W.H.
    New search for: He, J.L.
    New search for: Xiao, Y.Y.
    New search for: Li, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Research on HfSiN Diffusion Barrier Thin Film for Micro-Nanoscale ULSI-Cu Metallization

    Contributors:

    Liu, X.M. (author) / Chen, X.H. (author) / Han, Y.Q. (author) / Ma, W.H. (author) / He, J.L. (author) / Xiao, Y.Y. (author) / Li, J. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 809/810 ; 583-588

    Publication date:

    2015-01-01

    Size:

    6 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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