Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability: Fid-Bau Portal

Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability

Huang, J. J. / Tsai, Y. J. / Tsai, M. C. / Lee, M. H. / Chen, M. J.

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Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability

Huang, J. J. / Tsai, Y. J. / Tsai, M. C. / Lee, M. H. / Chen, M. J.

Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability

Huang, J. J. / Tsai, Y. J. / Tsai, M. C. / Lee, M. H. / Chen, M. J.

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Check availability in my library

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Document information

Title:

Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability

Contributors:

Huang, J. J. (author) / Tsai, Y. J. (author) / Tsai, M. C. (author) / Lee, M. H. (author) / Chen, M. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 330 ; 221-227

Publication date:

2015-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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