The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering: Fid-Bau Portal

The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering

Li, X.A. / Yang, R. / Liu, W.J. / Han, J. / Yang, J.B. / Yang, J.P. / Yang, T. / Gu, M.F.

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The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering

Li, X.A. / Yang, R. / Liu, W.J. / Han, J. / Yang, J.B. / Yang, J.P. / Yang, T. / Gu, M.F.

The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering

Li, X.A. / Yang, R. / Liu, W.J. / Han, J. / Yang, J.B. / Yang, J.P. / Yang, T. / Gu, M.F.

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Document information

Title:

The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering

Contributors:

Li, X.A. (author) / Yang, R. (author) / Liu, W.J. (author) / Han, J. (author) / Yang, J.B. (author) / Yang, J.P. (author) / Yang, T. (author) / Gu, M.F. (author)

Published in:

KEY ENGINEERING MATERIALS ; 636 ; 29-32

Publication date:

2015-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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