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The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering

Zhang, G. / Yan, P. / Wu, Z. / Wang, J. / Chen, J.

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The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering

Zhang, G. / Yan, P. / Wu, Z. / Wang, J. / Chen, J.

The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering

Zhang, G. / Yan, P. / Wu, Z. / Wang, J. / Chen, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering

Contributors:

Zhang, G. (author) / Yan, P. (author) / Wu, Z. (author) / Wang, J. (author) / Chen, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 5012-5015

Publication date:

2008-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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