Structure and antireflection properties of SiNWs arrays form mc-Si wafer through Ag-catalyzed chemical etching: Fid-Bau Portal

Structure and antireflection properties of SiNWs arrays form mc-Si wafer through Ag-catalyzed chemical etching

Li, S. / Ma, W. / Chen, X. / Xie, K. / Li, Y. / He, X. / Yang, X. / Lei, Y.

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Structure and antireflection properties of SiNWs arrays form mc-Si wafer through Ag-catalyzed chemical etching

Li, S. / Ma, W. / Chen, X. / Xie, K. / Li, Y. / He, X. / Yang, X. / Lei, Y.

Structure and antireflection properties of SiNWs arrays form mc-Si wafer through Ag-catalyzed chemical etching

Li, S. / Ma, W. / Chen, X. / Xie, K. / Li, Y. / He, X. / Yang, X. / Lei, Y.

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Document information

Title:

Structure and antireflection properties of SiNWs arrays form mc-Si wafer through Ag-catalyzed chemical etching

Contributors:

Li, S. (author) / Ma, W. (author) / Chen, X. (author) / Xie, K. (author) / Li, Y. (author) / He, X. (author) / Yang, X. (author) / Lei, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 369 ; 232-240

Publication date:

2016-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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