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    Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

    New search for: von Gastrow, G.
    New search for: Li, S.
    New search for: Putkonen, M.
    New search for: Laitinen, M.
    New search for: Sajavaara, T.
    New search for: Savin, H.

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    Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

    New search for: von Gastrow, G.
    New search for: Li, S.
    New search for: Putkonen, M.
    New search for: Laitinen, M.
    New search for: Sajavaara, T.
    New search for: Savin, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

    New search for: von Gastrow, G.
    New search for: Li, S.
    New search for: Putkonen, M.
    New search for: Laitinen, M.
    New search for: Sajavaara, T.
    New search for: Savin, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

    Contributors:

    von Gastrow, G. (author) / Li, S. (author) / Putkonen, M. (author) / Laitinen, M. (author) / Sajavaara, T. (author) / Savin, H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 357 ; 2402-2407

    Publication date:

    2015-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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