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    Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays

    New search for: Park, E. K.
    New search for: Kim, S.
    New search for: Heo, J.
    New search for: Kim, H. J.

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    Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays

    New search for: Park, E. K.
    New search for: Kim, S.
    New search for: Heo, J.
    New search for: Kim, H. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays

    New search for: Park, E. K.
    New search for: Kim, S.
    New search for: Heo, J.
    New search for: Kim, H. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays

    Contributors:

    Park, E. K. (author) / Kim, S. (author) / Heo, J. (author) / Kim, H. J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 370 ; 126-130

    Publication date:

    2016-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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