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    Electrical behaviour of SiOxNy thin films and correlation with structural defects

    New search for: Rebib, F.
    New search for: Tomasella, E.
    New search for: Aida, S.
    New search for: Dubois, M.
    New search for: Cellier, J.
    New search for: Jacquet, M.

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    Electrical behaviour of SiOxNy thin films and correlation with structural defects

    New search for: Rebib, F.
    New search for: Tomasella, E.
    New search for: Aida, S.
    New search for: Dubois, M.
    New search for: Cellier, J.
    New search for: Jacquet, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrical behaviour of SiOxNy thin films and correlation with structural defects

    New search for: Rebib, F.
    New search for: Tomasella, E.
    New search for: Aida, S.
    New search for: Dubois, M.
    New search for: Cellier, J.
    New search for: Jacquet, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Electrical behaviour of SiOxNy thin films and correlation with structural defects

    Contributors:

    Rebib, F. (author) / Tomasella, E. (author) / Aida, S. (author) / Dubois, M. (author) / Cellier, J. (author) / Jacquet, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 5607-5610

    Publication date:

    2006-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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