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    Quantitative depth profiling of SiOxNy layers on Si

    New search for: van Berkum, J. G.
    New search for: Hopstaken, M. J.
    New search for: Snijders, J. H.
    New search for: Tamminga, Y.
    New search for: Cubaynes, F. N.

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    Quantitative depth profiling of SiOxNy layers on Si

    New search for: van Berkum, J. G.
    New search for: Hopstaken, M. J.
    New search for: Snijders, J. H.
    New search for: Tamminga, Y.
    New search for: Cubaynes, F. N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Quantitative depth profiling of SiOxNy layers on Si

    New search for: van Berkum, J. G.
    New search for: Hopstaken, M. J.
    New search for: Snijders, J. H.
    New search for: Tamminga, Y.
    New search for: Cubaynes, F. N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Quantitative depth profiling of SiOxNy layers on Si

    Contributors:

    van Berkum, J. G. (author) / Hopstaken, M. J. (author) / Snijders, J. H. (author) / Tamminga, Y. (author) / Cubaynes, F. N. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 203-204 ; 414-417

    Publication date:

    2003-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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