Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates: Fid-Bau Portal

Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates

Amor, S. B. / Meddeb, H. / Daik, R. / Othman, A. B. / Slama, S. B. / Dimassi, W. / Ezzaouia, H.

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Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates

Amor, S. B. / Meddeb, H. / Daik, R. / Othman, A. B. / Slama, S. B. / Dimassi, W. / Ezzaouia, H.

Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates

Amor, S. B. / Meddeb, H. / Daik, R. / Othman, A. B. / Slama, S. B. / Dimassi, W. / Ezzaouia, H.

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Check availability in my library

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Document information

Title:

Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates

Contributors:

Amor, S. B. (author) / Meddeb, H. (author) / Daik, R. (author) / Othman, A. B. (author) / Slama, S. B. (author) / Dimassi, W. (author) / Ezzaouia, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 360 ; 572-578

Publication date:

2016-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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