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Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates
Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates
Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates
Amor, S. B. (Autor:in) / Meddeb, H. (Autor:in) / Daik, R. (Autor:in) / Othman, A. B. (Autor:in) / Slama, S. B. (Autor:in) / Dimassi, W. (Autor:in) / Ezzaouia, H. (Autor:in)
APPLIED SURFACE SCIENCE ; 360 ; 572-578
01.01.2016
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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