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Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
Kanomata, K. (author) / Tokoro, K. (author) / Imai, T. (author) / Pansila, P. (author) / Miura, M. (author) / Ahmmad, B. (author) / Kubota, S. (author) / Hirahara, K. (author) / Hirose, F. (author)
APPLIED SURFACE SCIENCE ; 387 ; 497-502
2016-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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