IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor: Fid-Bau Portal

IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Hirose, F. / Kinoshita, Y. / Kanomata, K. / Momiyama, K. / Kubota, S. / Hirahara, K. / Kimura, Y. / Niwano, M.

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IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Hirose, F. / Kinoshita, Y. / Kanomata, K. / Momiyama, K. / Kubota, S. / Hirahara, K. / Kimura, Y. / Niwano, M.

IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Hirose, F. / Kinoshita, Y. / Kanomata, K. / Momiyama, K. / Kubota, S. / Hirahara, K. / Kimura, Y. / Niwano, M.

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Document information

Title:

IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Contributors:

Hirose, F. (author) / Kinoshita, Y. (author) / Kanomata, K. (author) / Momiyama, K. (author) / Kubota, S. (author) / Hirahara, K. (author) / Kimura, Y. (author) / Niwano, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 7726-7731

Publication date:

2012-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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