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Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing
Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing
Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing
Olarinoye, O. (author) / Ogundare, F. (author)
International journal of materials research ; 106 ; 514-520
2015-01-01
7 pages
Article (Journal)
English
DDC:
669.9
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