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    Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing

    New search for: Olarinoye, O.
    New search for: Ogundare, F.

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    Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing

    New search for: Olarinoye, O.
    New search for: Ogundare, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing

    New search for: Olarinoye, O.
    New search for: Ogundare, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing

    Contributors:

    Olarinoye, O. (author) / Ogundare, F. (author)

    Published in:

    International journal of materials research ; 106 ; 514-520

    Publication date:

    2015-01-01

    Size:

    7 pages

    ISSN:

    1862-5282

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  669.9

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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