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    Influence of the nitrogen fraction on AlN thin film deposited by cathodic arc ion

    New search for: Khan, Shakil
    New search for: Ahmed, Ishaq
    New search for: Mehmood, Mazhar
    New search for: Sadiq, Gulfam

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    Influence of the nitrogen fraction on AlN thin film deposited by cathodic arc ion

    New search for: Khan, Shakil
    New search for: Ahmed, Ishaq
    New search for: Mehmood, Mazhar
    New search for: Sadiq, Gulfam

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of the nitrogen fraction on AlN thin film deposited by cathodic arc ion

    New search for: Khan, Shakil
    New search for: Ahmed, Ishaq
    New search for: Mehmood, Mazhar
    New search for: Sadiq, Gulfam

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Influence of the nitrogen fraction on AlN thin film deposited by cathodic arc ion

    Contributors:

    Khan, Shakil (author) / Ahmed, Ishaq (author) / Mehmood, Mazhar (author) / Sadiq, Gulfam (author)

    Published in:

    Materials science in semiconductor processing ; 29 ; 193-200

    Publication date:

    2015-01-01

    Size:

    8 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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