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RF plasma treatment of shallow ion-implanted layers of germanium

Okholin, P.N. / Glotov, V.I. / Nazarov, A.N. / Yuchymchuk, V.O. / Kladko, V.P. / Kryvyi, S.B. / Lytvyn, P.M. / Tiagulskyi, S.I. / Lysenko, V.S. / Shayesteh, M. / ... [more]

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RF plasma treatment of shallow ion-implanted layers of germanium

Okholin, P.N. / Glotov, V.I. / Nazarov, A.N. / Yuchymchuk, V.O. / Kladko, V.P. / Kryvyi, S.B. / Lytvyn, P.M. / Tiagulskyi, S.I. / Lysenko, V.S. / Shayesteh, M. / ... [more]

RF plasma treatment of shallow ion-implanted layers of germanium

Okholin, P.N. / Glotov, V.I. / Nazarov, A.N. / Yuchymchuk, V.O. / Kladko, V.P. / Kryvyi, S.B. / Lytvyn, P.M. / Tiagulskyi, S.I. / Lysenko, V.S. / Shayesteh, M. / ... [more]

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Title:

RF plasma treatment of shallow ion-implanted layers of germanium

Contributors:

Okholin, P.N. (author) / Glotov, V.I. (author) / Nazarov, A.N. (author) / Yuchymchuk, V.O. (author) / Kladko, V.P. (author) / Kryvyi, S.B. (author) / Lytvyn, P.M. (author) / Tiagulskyi, S.I. (author) / Lysenko, V.S. (author) / Shayesteh, M. (author)

Published in:

Materials science in semiconductor processing ; 42 ; 204-209

Publication date:

2016-01-01

Size:

6 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

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