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    Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films

    New search for: He, G.
    New search for: Zhu, L. Q.
    New search for: Liu, M.
    New search for: Fang, Q.
    New search for: Zhang, L. D.

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    Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films

    New search for: He, G.
    New search for: Zhu, L. Q.
    New search for: Liu, M.
    New search for: Fang, Q.
    New search for: Zhang, L. D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films

    New search for: He, G.
    New search for: Zhu, L. Q.
    New search for: Liu, M.
    New search for: Fang, Q.
    New search for: Zhang, L. D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films

    Contributors:

    He, G. (author) / Zhu, L. Q. (author) / Liu, M. (author) / Fang, Q. (author) / Zhang, L. D. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 3413-3418

    Publication date:

    2007-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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