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TiSiOx gate dielectrics produced by reactive sputtering for high performance InGaZnO thin film transistors
TiSiOx gate dielectrics produced by reactive sputtering for high performance InGaZnO thin film transistors
TiSiOx gate dielectrics produced by reactive sputtering for high performance InGaZnO thin film transistors
Fu, Yi-Zhou (author) / Li, Jun (author) / Zhao, Cheng-Yu (author) / Huang, Chuan-Xin (author) / Zhang, Jian-Hua (author) / Li, Xi-Feng (author) / Jiang, Xue-Yin (author) / Zhang, Zhi-Lin (author)
Materials science in semiconductor processing ; 61 ; 125-130
2017-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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