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Evaluation of Schottky barrier source/drain contact on gate-all-around polycrystalline silicon nanowire MOSFET
Evaluation of Schottky barrier source/drain contact on gate-all-around polycrystalline silicon nanowire MOSFET
Evaluation of Schottky barrier source/drain contact on gate-all-around polycrystalline silicon nanowire MOSFET
Ho, Ching-Yuan (author) / Chang, Yew-Jen (author)
Materials science in semiconductor processing ; 61 ; 150-155
2017-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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