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Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering
Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering
Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering
Kozak, A.O. (author) / Porada, O.K. (author) / Ivashchenko, V.I. (author) / Ivashchenko, L.A. (author) / Scrynskyy, P.L. (author) / Tomila, T.V. (author) / Manzhara, V.S. (author)
Applied surface science ; 425 ; 646-653
2017-01-01
8 pages
Article (Journal)
English
DDC:
620.44
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