A platform for research: civil engineering, architecture and urbanism
Tailored wafer holder for a reliable deposition of sputtered aluminium nitride thin films at low temperatures
Tailored wafer holder for a reliable deposition of sputtered aluminium nitride thin films at low temperatures
Tailored wafer holder for a reliable deposition of sputtered aluminium nitride thin films at low temperatures
Fischeneder, M. (author) / Wistrela, E. (author) / Bittner, A. (author) / Schneider, M. (author) / Schmid, U. (author)
Materials science in semiconductor processing ; 71 ; 283-289
2017-01-01
7 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2017
|British Library Online Contents | 2017
|Deposition mechanism of sputtered amorphous carbon nitride thin film
British Library Online Contents | 2004
|Aluminium nitride thin films prepared by ion beam assisted deposition method
British Library Online Contents | 1998
|Growth mechanism of reactively sputtered aluminum nitride thin films
British Library Online Contents | 2002
|