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    In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics

    New search for: Tsai, Meng-Chen
    New search for: Lee, Min-Hung
    New search for: Kuo, Chin-Lung
    New search for: Lin, Hsin-Chih
    New search for: Chen, Miin-Jang

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    In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics

    New search for: Tsai, Meng-Chen
    New search for: Lee, Min-Hung
    New search for: Kuo, Chin-Lung
    New search for: Lin, Hsin-Chih
    New search for: Chen, Miin-Jang

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics

    New search for: Tsai, Meng-Chen
    New search for: Lee, Min-Hung
    New search for: Kuo, Chin-Lung
    New search for: Lin, Hsin-Chih
    New search for: Chen, Miin-Jang

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics

    Contributors:

    Tsai, Meng-Chen (author) / Lee, Min-Hung (author) / Kuo, Chin-Lung (author) / Lin, Hsin-Chih (author) / Chen, Miin-Jang (author)

    Published in:

    Applied surface science ; 387 ; 274-279

    Publication date:

    2016-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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