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Improved interface and electrical properties of atomic layer deposited Al2O3/4H-SiC
Improved interface and electrical properties of atomic layer deposited Al2O3/4H-SiC
Improved interface and electrical properties of atomic layer deposited Al2O3/4H-SiC
Suvanam, Sethu Saveda (author) / Usman, Muhammed (author) / Martin, David (author) / Yazdi, Milad. G. (author) / Linnarsson, Margareta (author) / Tempez, Agnès (author) / Götelid, Mats (author) / Hallén, Anders (author)
Applied surface science ; 433 ; 108-115
2018-01-01
8 pages
Article (Journal)
English
DDC:
620.44
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Improved interface and electrical properties of atomic layer deposited Al2O3/4H-SiC
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